Don't even mention the next-generation lithography machine that ASML is still designing; it even falls a bit short of the performance of the current mainstream lithography machines. However, it has achieved a minimum NA (numerical aperture) of 1.36.
Based on the feedback, with just a few adjustments, the production process for the 3NM limit can be completed.
Although it's still a bit behind ASML's latest two-nanometer limit process, it has essentially caught up to the mainstream, and the gap from the international top level has been narrowed to a tolerable extent.
And if we were to make a comparison, the production efficiency of the Photolithography Factory is much higher than that of a single lithography machine, coupled with an intelligent operating system, it can batch print up to thirteen different specifications of chips at the same time. In theory, a production efficiency of 2737 chips per hour can be achieved.